Applied Materials Launches Epi System Focused on NMOS Strain
posted on July 22, 2013 12:04
Applied Materials (AMAT) had an analyst day on Monday, and in the morning they invited a few of us to some product launches. The one that caught my eye and ear was a new epi system focused on NMOS epitaxial source/drains to create channel strain, since that has been mooted as a next step for several years now, but not shown up in a production context.
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