Intel Says EUV Ready, Challenging
posted on June 10, 2019 13:01
SAN JOSE, Calif. — Extreme ultraviolet (EUV) lithography is “ready for introduction … and running in volume for technology development,” said the head of Intel’s EUV program. But engineers still face several challenges harnessing the complex and costly systems to make leading-edge chips in high volume, she said.
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