posted on December 14, 2015 13:03
CEA-Leti today announced it has developed two techniques to induce local strain in FD-SOI processes for next-generation FD-SOI circuits that will produce more speed at the same, or lower, power consumption, and improve performance.
View Full Article . . .
Receive pre-event offers for first choice enrollment in seminars and events. Periodic updates on state-of-the-art industry standards and innovations.
The Threshold Network: Join Now!
Advanced CMOS Technology
Fundamentals of Microchip Design and Fabrication
5/3nm FinFET Fabrication
The 3D Packaging Revolution
Advanced Lithography
Remote Learning
Learning Methodology