Tackling advanced litho challenges on the path to node 5
posted on August 03, 2015 11:02
If you attended just about any mask making conference in the last five to seven years, you would have heard the lament about exploding data volumes and their impact on mask writing time and, by extension, mask costs. The industry is still concerned with data volumes, whether 193nm immersion or EUVL.
View Full Article . . .
|
|